| 摘要 |
PROBLEM TO BE SOLVED: To provide a photosensitive resin composition and a spacer produced by using the composition.SOLUTION: The photosensitive resin composition comprises an alkali-soluble resin, a photocurable monomer, a photopolymerization initiator, an amino acetophenone-based or amino benzaldehyde-based hydrogen donor, and a solvent, in which photoreactivity is further improved by activating an alkyl radical generated from the photopolymerization initiator to maximize light efficiency, and thereby extremely improved sensitivity is obtained. |
