发明名称 |
OXIDE FOR SEMICONDUCTOR LAYER OF THIN FILM TRANSISTOR, THIN FILM TRANSISTOR, AND DISPLAY APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide an oxide for a semiconductor layer of a thin film transistor having high mobility and reduced defect density.SOLUTION: The oxide for a semiconductor layer of a thin film transistor contains an oxide composed of metal elements of In, Zn, and Sn, wherein defect density of the oxide is 7.5×10cmor less, and mobility is 15 cm/Vs or more. |
申请公布号 |
JP2014175503(A) |
申请公布日期 |
2014.09.22 |
申请号 |
JP20130047347 |
申请日期 |
2013.03.08 |
申请人 |
KOBE STEEL LTD |
发明人 |
KOSAKA SHUJI;HAYASHI KAZUSHI |
分类号 |
H01L29/786;C23C14/08;H01L21/203;H01L21/336 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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