发明名称 OXIDE FOR SEMICONDUCTOR LAYER OF THIN FILM TRANSISTOR, THIN FILM TRANSISTOR, AND DISPLAY APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide an oxide for a semiconductor layer of a thin film transistor having high mobility and reduced defect density.SOLUTION: The oxide for a semiconductor layer of a thin film transistor contains an oxide composed of metal elements of In, Zn, and Sn, wherein defect density of the oxide is 7.5×10cmor less, and mobility is 15 cm/Vs or more.
申请公布号 JP2014175503(A) 申请公布日期 2014.09.22
申请号 JP20130047347 申请日期 2013.03.08
申请人 KOBE STEEL LTD 发明人 KOSAKA SHUJI;HAYASHI KAZUSHI
分类号 H01L29/786;C23C14/08;H01L21/203;H01L21/336 主分类号 H01L29/786
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