发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To determine quality of discharging operation precisely.SOLUTION: A substrate processing apparatus includes a discharge head 31 which moves from above a substrate held by a substrate holding section to an inspection position above a standby pod 41 arranged outside a cup. At the inspection position, a processing liquid discharged from the discharge head 31 toward the standby pod 41 is irradiated with planar light emitted from a light emitter 51. Then an imaging section 52 obtains an inspection image including bright spots which appear on the processing liquid. A determination section determines whether the discharging operation of the discharge head 31 is good or bad on the basis of the inspection image. Thus, compared with the case in which inspection of the discharging operation is performed by discharging the processing liquid from the discharge head 31 above the substrate, quality of the discharging operation of the discharge head 31 can be precisely determined by eliminating reflected light from the substrate and influence of droplets and mist of the processing liquid which collides against the substrate.
申请公布号 JP2014175629(A) 申请公布日期 2014.09.22
申请号 JP20130049861 申请日期 2013.03.13
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 SATO MASANOBU;YASHIKI HIROYUKI
分类号 H01L21/304;B05C5/00;B05C11/00;B05C11/08 主分类号 H01L21/304
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