| 摘要 |
PROBLEM TO BE SOLVED: To provide an imprint method which allows for stabilized fabrication of a high accuracy pattern structure by preventing damage, and the like, of a mold, and to provide a mold for imprint and an imprint device.SOLUTION: An imprint method includes a resin supply step for supplying a molded resin to a transfer substrate at a supply position, a contact step for forming a molded resin layer by transferring the transfer substrate from the supply position to a transfer position, approaching a mold having an uneven structure and the transfer substrate, and forming the molded resin layer by developing the molded resin between the mold and the transfer substrate, a curing step for curing the molded resin layer into a transfer resin layer where the uneven structure is transferred, and a release step for separating the transfer resin layer and the mold to bring about a state where a pattern structure, i.e., the transfer resin layer, is located on the transfer substrate. At least during transfer of the transfer substrate to the transfer position, removal operation of a foreign matter existing in the atmosphere and/or the transfer substrate is performed. |
