发明名称 NON-VOLATILE SEMICONDUCTOR MEMORY
摘要 <p>PROBLEM TO BE SOLVED: To provide a non-volatile semiconductor memory capable of facilitating operation control and circuit layout designing while increasing the operation speed such as reading speed, writing speed and deleting speed.SOLUTION: The non-volatile semiconductor memory includes: a semiconductor substrate 30; a first layer BG formed above the semiconductor substrate; a first conductive layer CG, an inter-electrode insulation layer 53a and a second conductive layer CG which are laminated above the first layer; a memory layer formed over the inner surface of a pair of though holes 49 which are formed in the first conductive layer, the inter-electrode insulation layer and second conductive layer; a semiconductor layer SP formed over the memory layer within the pair of though holes and at least a part of which is crystallized; and a metal layer 70 which is in contact with the semiconductor layer and which is formed at least in a part of the though hole and/or at least a part within a connection hole connecting the bottom ends of the pair of though holes formed in the first layer.</p>
申请公布号 JP2014175348(A) 申请公布日期 2014.09.22
申请号 JP20130044205 申请日期 2013.03.06
申请人 TOSHIBA CORP 发明人 KAWAI TOMOYA;FUJIKI JUN;FUKUZUMI YOSHIAKI;AOCHI HIDEAKI
分类号 H01L27/115;H01L21/3205;H01L21/336;H01L21/768;H01L21/8247;H01L23/532;H01L27/10;H01L29/788;H01L29/792 主分类号 H01L27/115
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