HEAT-RAY REFLECTIVE MEMBER AND PRODUCTION METHOD THEREOF

摘要

PROBLEM TO BE SOLVED: To provide a novel heat-ray reflective member suitably usable for a thermal treatment device or the like used for production of a silicon semiconductor or the like.SOLUTION: A heat-ray reflective member 1 includes a substrate 10 and a heat-ray reflective layer 20. The heat-ray reflective layer 20 is disposed on the substrate 10. The heat-ray reflective layer 20 is formed by laminating alternately a silicon layer 22 and a silicon oxide layer 21. The silicon layer 22 contains crystal silicon.