发明名称 DEFECT INSPECTION METHOD AND DEVICE USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a defect inspection device capable of allowing an inspection surface, a focal point of illumination light, and focal points of plural detection optical systems to be brought into stably coincide within respective focal depth areas, and allowing each of the plural detection optical systems to stably detect a high-resolution image.SOLUTION: A defect inspection device to inspect a sample comprises: a movable table part on which a sample to be inspected and a pattern chip are placed; an illumination light irradiation part to irradiate linearly-formed illumination light onto a surface of the sample and the pattern chip; a detection optical system part in which detection optical systems are disposed at plural places above the table part to detect an image of diffused light from the sample; and a signal processor to process detected signals to detect a defect. The pattern chip has plural repeating patterns formed periodically thereon to generate diffused light depending on each position of objective lenses of the plural detection optical systems of the detection optical system part upon irradiation of the linearly-formed illumination light from the illumination light irradiation part.
申请公布号 JP2014174052(A) 申请公布日期 2014.09.22
申请号 JP20130048272 申请日期 2013.03.11
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 SHIBATA YUKIHIRO;FUKUSHIMA HIDEKI;URANO YUTA;HONDA TOSHIFUMI
分类号 G01N21/956;H01L21/66 主分类号 G01N21/956
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