发明名称 TRANSPARENT GAS BARRIER FILM AND METHOD FOR MANUFACTURING TRANSPARENT GAS BARRIER FILM
摘要 Disclosed in the present invention are a transparent gas barrier film and a method for manufacturing the same. The film in the present invention comprises a substrate; a silicon nitride layer located on the upper part of the substrate and acting as a main barrier layer; and an aluminum oxide layer existed between the substrate and the silicon nitride layer to provide a role of a barrier layer and transparency, and controlling the surficial roughness of the silicon nitride layer at the same time.
申请公布号 KR20140111778(A) 申请公布日期 2014.09.22
申请号 KR20130026100 申请日期 2013.03.12
申请人 LS MTRON LTD. 发明人 CHO, WON JE;KIM, WON SIK;SHIN, CHUNG HWAN
分类号 B32B9/00;B32B27/06 主分类号 B32B9/00
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