发明名称 |
TRANSPARENT GAS BARRIER FILM AND METHOD FOR MANUFACTURING TRANSPARENT GAS BARRIER FILM |
摘要 |
Disclosed in the present invention are a transparent gas barrier film and a method for manufacturing the same. The film in the present invention comprises a substrate; a silicon nitride layer located on the upper part of the substrate and acting as a main barrier layer; and an aluminum oxide layer existed between the substrate and the silicon nitride layer to provide a role of a barrier layer and transparency, and controlling the surficial roughness of the silicon nitride layer at the same time. |
申请公布号 |
KR20140111778(A) |
申请公布日期 |
2014.09.22 |
申请号 |
KR20130026100 |
申请日期 |
2013.03.12 |
申请人 |
LS MTRON LTD. |
发明人 |
CHO, WON JE;KIM, WON SIK;SHIN, CHUNG HWAN |
分类号 |
B32B9/00;B32B27/06 |
主分类号 |
B32B9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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