发明名称 NONVOLATILE SEMICONDUCTOR STORAGE DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To provide a nonvolatile semiconductor storage device which achieves good controllability in a first insulation layer and which can reduce a leakage current from a second insulation layer due to a large coupling ratio, and which enables writing at low voltage.SOLUTION: A nonvolatile semiconductor storage device comprises a plurality of memory cells which can store data of more than binary. The memory cell includes a semiconductor layer 1B, a first insulation layer 2B on the semiconductor layer, a charge storage layer 3B on the first insulation layer, a second insulation layer 4B on the charge storage layer and a control gate electrode 5B on the second insulation layer. The second insulation layer 4B includes a ferroelectric layer. Further, polarized alignment pulse voltage is applied to the control gate electrode 5B before being read out.</p>
申请公布号 JP2014175480(A) 申请公布日期 2014.09.22
申请号 JP20130046983 申请日期 2013.03.08
申请人 TOSHIBA CORP 发明人 TOKUHIRA KOKI;NAKAI TSUKASA;TANIMOTO KOKICHI;KONDO MASAKI;TODA TOSHIYUKI;AOKI NOBUTOSHI
分类号 H01L21/336;G11C16/02;G11C16/04;G11C16/06;H01L21/8246;H01L21/8247;H01L27/10;H01L27/105;H01L27/115;H01L29/788;H01L29/792 主分类号 H01L21/336
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