INTEGRATED CIRCUIT DEVICE AND METHOD OF CREATING MASK LAYOUT

摘要

PROBLEM TO BE SOLVED: To provide an integrated circuit device which suppresses occurrence of defects of wiring even when micronized and a method of creating a mask layout.SOLUTION: A method of creating a mask layout is for creating a mask layout of an exposure mask used in forming wiring of an integrated circuit device and includes a step of estimating the shape of wiring to be formed according to an edge of a pattern contained an initial layout of the exposure mask and a step of correcting the shape of the edge when the estimated shape of wiring does not meet requirements.