发明名称 MAGNETORESISTIVE STRUCTURE, MAGNETIC RANDOM ACCESS MEMORY DEVICE AND MANUFACTURING METHOD OF THE SAME
摘要 A magnet resistive structure, a memory element including the same, and a manufacturing method for the magnet resistive structure are disclosed. The magnet resistive structure comprises a first magnetic layer of which the magnet direction is changeable; a second magnetic layer formed to correspond to the first magnetic layer and of which the magnet direction is changeable; and an MR enhancing layer and an intermediate layer formed between the two magnetic layers. Accordingly, the magnet resistive structure having an enhanced magnet resistive ratio is provided.
申请公布号 KR20140111508(A) 申请公布日期 2014.09.19
申请号 KR20130025745 申请日期 2013.03.11
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, KEE WON;KIM, KWANG SEOK;LEE, SUNG CHUL;JANG, YOUNG MAN;PI, UNG HWAN
分类号 G11C11/15;H01L21/8247;H01L27/115 主分类号 G11C11/15
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