发明名称 |
MAGNETORESISTIVE STRUCTURE, MAGNETIC RANDOM ACCESS MEMORY DEVICE AND MANUFACTURING METHOD OF THE SAME |
摘要 |
A magnet resistive structure, a memory element including the same, and a manufacturing method for the magnet resistive structure are disclosed. The magnet resistive structure comprises a first magnetic layer of which the magnet direction is changeable; a second magnetic layer formed to correspond to the first magnetic layer and of which the magnet direction is changeable; and an MR enhancing layer and an intermediate layer formed between the two magnetic layers. Accordingly, the magnet resistive structure having an enhanced magnet resistive ratio is provided. |
申请公布号 |
KR20140111508(A) |
申请公布日期 |
2014.09.19 |
申请号 |
KR20130025745 |
申请日期 |
2013.03.11 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM, KEE WON;KIM, KWANG SEOK;LEE, SUNG CHUL;JANG, YOUNG MAN;PI, UNG HWAN |
分类号 |
G11C11/15;H01L21/8247;H01L27/115 |
主分类号 |
G11C11/15 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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