发明名称 Methods and apparatuses for roll-on coating
摘要 Methods and apparatuses for a deposition system are provided to deposit a thin coating layer on flat substrates, such as semiconductors or panels. In an embodiment, liquid supplied rollers accepting liquid media provide liquid chemicals to the substrates for coating the substrates. The liquid delivery system can control the flow and the pressure of the liquid to achieve optimum process condition with minimum excess waste. In another embodiment, rollers with non-uniform distribution of liquid media provide a non-uniform thickness profile on the substrates, which can be used to compensate for the non-uniformity of subsequent processes.
申请公布号 US2014259498(A1) 申请公布日期 2014.09.18
申请号 US201414294141 申请日期 2014.06.02
申请人 Dynamic Micro Systems, Semiconductor Equipment GmbH 发明人 Rebstock Lutz;Wolke Klaus Conrad
分类号 B05C1/08 主分类号 B05C1/08
代理机构 代理人
主权项 1. A roller comprising: an elongated rod, wherein the elongated rod is configured for accepting a fluid at an end of the elongated rod, wherein the elongated rod configured to transfer the fluid from the end of the rod to at least a first portion of an outer surface of the elongated rod; and a layer covering at least a second portion of the outer surface of the elongated rod for receiving the fluid at the outer surface of the elongated rod, wherein the elongated rod is operable to produce a coating layer on a substrate surface, wherein the coating layer is non-uniform in thickness in a direction along a length of the elongated rod.
地址 Radolfzell DE