| 摘要 |
<p>To make it possible to suppress pattern collapse and to improve the depth of focus (DOF) in a ultrafine region (for example, in a region having a line width of 50 nm or less). An active light-sensitive or radiation-sensitive resin composition which contains (A) a resin having a repeating unit that is decomposed by the action of an acid and produces a polar group, (B) a compound which generates an acid when irradiated with active light or radiation, and (F) a compound represented by general formula (1). In general formula (1), R1 represents an alkyl group, a cycloalkyl group, an aryl group or an acyl group, and if there are a plurality of R1 moieties, each R1 independently represents an alkyl group, a cycloalkyl group, an aryl group or an acyl group; X represents an organic group that has at least one group selected from the group consisting of an amino group, a nitrogen-containing heterocyclic group, an epoxy group, a methacryloyl group, a vinyl group and a mercapto group, an alkyl group, a cycloalkyl group, an aryl group or an alkoxy group; and n represents an integer of 0-3.</p> |
