发明名称 SUBSTRATE PROCESSING SYSTEM AND SUBSTRATE TURNOVER DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a substrate processing system capable of continuously turning over substrates.SOLUTION: The substrate processing system includes: multiple first and second conveyance devices disposed at intervals; and a substrate turnover device 100 having a pair of holding arm groups 102 disposed so as to have rotational symmetry around a rotary shaft 101a, having multiple holding arms 102 to pass through gaps between unit conveyance elements 301 when rotating around the rotary shaft 101a, and capable of being lifted by lift means. Multiple sucker parts 103 provided at holding arms 102 included in one of the pair of holding arm groups 102 are made to stick to a substrate W to be turned over, and after that, the pair of holding arm groups 102 are rotated around the rotary shaft 101a by 180 degrees, thereby the substrate W is turned over. After adhesion of the substrate W and until the turnover is completed, the pair of holding arm groups 102 are made to ascend higher than a position where the substrate W is handed over, and when the adhesion is canceled after the turnover, made to descend to the position where the substrate W is handed over.
申请公布号 JP2014169177(A) 申请公布日期 2014.09.18
申请号 JP20130043127 申请日期 2013.03.05
申请人 MITSUBOSHI DIAMOND INDUSTRIAL CO LTD 发明人 NARUO TORU
分类号 B65H15/00;B28D1/24;C03B35/00 主分类号 B65H15/00
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