发明名称 |
Inductor System and Method |
摘要 |
A system and method for providing and manufacturing an inductor is provided. In an embodiment similar masks are reutilized to form differently sized inductors. For example, a two turn inductor and a three turn inductor may share masks for interconnects and coils, while only masks necessary for connections between the interconnects and coils may need to be newly developed. |
申请公布号 |
US2014264735(A1) |
申请公布日期 |
2014.09.18 |
申请号 |
US201414182116 |
申请日期 |
2014.02.17 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Tsai Hao-Yi;Chen Hsien-Wei;Kuo Hung-Yi;Yu Tsung-Yuan |
分类号 |
H01L49/02;H01L23/522 |
主分类号 |
H01L49/02 |
代理机构 |
|
代理人 |
|
主权项 |
1. A method of manufacturing semiconductor devices, the method comprising;
manufacturing a first inductor using a first mask and a second mask; and manufacturing a second inductor using the first mask and a third mask but not the second mask. |
地址 |
Hsin-Chu TW |