ROTATION ENABLED MULTIFUNCTIONAL HEATER-CHILLER PEDESTAL

摘要

Embodiments of the present disclosure provide apparatus and methods for improving process uniformity. Particularly, embodiments of the present disclosure provide a rotatable temperature controlled substrate support for a semiconductor processing chamber. The rotatable temperature controlled substrate support includes one or more heating elements, one or more temperature sensors and cooling channels for circulating a cooling/heating fluid in the rotatable temperature controlled substrate support. One embodiment of the present disclosure includes a thermocouple extension assembly for extending cold junctions of the thermocouple in the substrate support away from the substrate support. The thermocouple extension assembly includes extension cords formed from materials matching with the materials of thermocouple.

主权项

1. A substrate support assembly, comprising:
a substrate support body having a substrate supporting surface; a shaft extending from the substrate support body, wherein the shaft has a first end attached to the substrate support body and a second end away from the substrate support body, and the shaft is hollow having an inner volume extending from the first end to the second end; a thermocouple attached to the substrate support body, wherein first and second connectors of the thermocouple extend down the inner volume to the second end of the shaft; and a thermocouple extension attached to a second end of the shaft, wherein the thermocouple extension comprises:
a first extension having a first end for receiving the first connector of the thermocouple and a second end positioned away from the first end, wherein the first extension and the first connector are formed from the same material; anda second extension having a first end for receiving the second connector of the thermocouple and a second end positioned away from the first end, wherein the second extension and the second connector are formed from the same material.