发明名称 METHODS FOR FABRICATING GUIDE PATTERNS AND METHODS FOR FABRICATING INTEGRATED CIRCUITS USING SUCH GUIDE PATTERNS
摘要 Methods for fabricating guide patterns and methods for fabricating integrated circuits using guide patterns are provided. In an embodiment, a method for fabricating a guide pattern includes forming a coating of a material with latent grafting sites and a photosensitive component configured to activate the latent grafting sites upon exposure over a substrate. The method exposes selected latent grafting sites in the coating to convert the selected latent grafting sites to active grafting sites. A grafting agent is bonded to the active grafting sites to form the guide pattern.
申请公布号 US2014273475(A1) 申请公布日期 2014.09.18
申请号 US201313804112 申请日期 2013.03.14
申请人 GLOBALFOUNDRIES, INC. 发明人 Schmid Gerard M.;Farrell Richard
分类号 H01L21/308;H01L21/311;H01L21/3105 主分类号 H01L21/308
代理机构 代理人
主权项 1. A method for fabricating a guide pattern comprising: forming a coating of a material including latent grafting sites and a photosensitive component configured to activate the latent grafting sites upon exposure over a substrate; exposing selected latent grafting sites in the coating to convert the selected latent grafting sites to active grafting sites; and bonding a grafting agent to the active grafting sites to form the guide pattern.
地址 Grand Cayman KY