发明名称 |
METHODS FOR FABRICATING GUIDE PATTERNS AND METHODS FOR FABRICATING INTEGRATED CIRCUITS USING SUCH GUIDE PATTERNS |
摘要 |
Methods for fabricating guide patterns and methods for fabricating integrated circuits using guide patterns are provided. In an embodiment, a method for fabricating a guide pattern includes forming a coating of a material with latent grafting sites and a photosensitive component configured to activate the latent grafting sites upon exposure over a substrate. The method exposes selected latent grafting sites in the coating to convert the selected latent grafting sites to active grafting sites. A grafting agent is bonded to the active grafting sites to form the guide pattern. |
申请公布号 |
US2014273475(A1) |
申请公布日期 |
2014.09.18 |
申请号 |
US201313804112 |
申请日期 |
2013.03.14 |
申请人 |
GLOBALFOUNDRIES, INC. |
发明人 |
Schmid Gerard M.;Farrell Richard |
分类号 |
H01L21/308;H01L21/311;H01L21/3105 |
主分类号 |
H01L21/308 |
代理机构 |
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代理人 |
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主权项 |
1. A method for fabricating a guide pattern comprising:
forming a coating of a material including latent grafting sites and a photosensitive component configured to activate the latent grafting sites upon exposure over a substrate; exposing selected latent grafting sites in the coating to convert the selected latent grafting sites to active grafting sites; and bonding a grafting agent to the active grafting sites to form the guide pattern. |
地址 |
Grand Cayman KY |