发明名称 |
SYSTEMS, METHODS, AND APPARATUS FOR PRODUCTION COATINGS OF LOW-EMISSIVITY GLASS INCLUDING A TERNARY ALLOY |
摘要 |
Disclosed herein are systems, methods, and apparatus for forming low emissivity panels that may include a substrate and a reflective layer formed over the substrate. The low emissivity panels may further include a top dielectric layer formed over the reflective layer such that the reflective layer is formed between the top dielectric layer and the substrate. The top dielectric layer may include a ternary metal oxide, such as zinc tin aluminum oxide. The top dielectric layer may also include aluminum. The concentration of aluminum may be between about 1 atomic % and 15 atomic % or between about 2 atomic % and 10 atomic %. An atomic ratio of zinc to tin in the top dielectric layer may be between about 0.67 and about 1.5 or between about 0.9 and about 1.1. |
申请公布号 |
US2014268316(A1) |
申请公布日期 |
2014.09.18 |
申请号 |
US201314139350 |
申请日期 |
2013.12.23 |
申请人 |
Intermolecular Inc. |
发明人 |
Zhang Guizhen;Boyce Brent;Cheng Jeremy;Ding Guowen;Imran Muhammad;Le Minh Huu;Schweigert Daniel;Xu Yongli |
分类号 |
G02B5/26;B29D11/00 |
主分类号 |
G02B5/26 |
代理机构 |
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代理人 |
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主权项 |
1. A low emissivity panel comprising:
a substrate; a reflective layer formed over the substrate; and a top dielectric layer formed over the reflective layer such that the reflective layer is formed between the top dielectric layer and the substrate,
the top dielectric layer comprising a zinc tin aluminum oxide, wherein an atomic ratio of zinc to tin in the top dielectric layer is between about 0.67 and about 1.5. |
地址 |
San Jose CA US |