发明名称 Indium Oxide Transparent Conductive Film
摘要 An indium oxide sintered compact containing zirconium as an additive, wherein the ratio of atomic concentration of zirconium to the sum of the atomic concentration of indium and the atomic concentration of zirconium is in the range of 0.5 to 4%, the relative density is 99.3% or higher, and the bulk resistance is 0.5 mΩ·cm or less. An indium oxide transparent conductive film of high transmittance in the visible light region and the infrared region, with low film resistivity, and in which the crystallization temperature can be controlled, as well as the manufacturing method thereof, and an oxide sintered compact for use in producing such transparent conductive film are provided.
申请公布号 US2014264197(A1) 申请公布日期 2014.09.18
申请号 US201414291165 申请日期 2014.05.30
申请人 JX Nippon Mining & Metals Corporation 发明人 Takami Hideo;Ikisawa Masakatsu
分类号 H01B1/08 主分类号 H01B1/08
代理机构 代理人
主权项 1. An indium oxide transparent conductive film containing zirconium as an additive, wherein a ratio of atomic concentration of zirconium to a sum of that of indium and zirconium is in a range of 0.5 to 4%, resistivity is 8 x 10−4 Ω·cm or less, electron mobility is 15 cm2/V·s or more, transmittance in a wavelength of 1200 nm is 85% or higher, and the indium oxide transparent conductive film is amorphous.
地址 Tokyo JP