| 发明名称 |
METHODS FOR TREATMENT OF A SUBTERRANEAN FORMATION |
| 摘要 |
The present invention relates to methods of treating subterranean formations. In various embodiments, the present invention provides a method of treating a subterranean formation including placing a first aqueous composition and a second aqueous composition in a subterranean formation. The placing includes injecting the first aqueous composition through a tubular passage in a wellbore. The placing also includes injecting the second aqueous composition through an annular passage in the wellbore. |
| 申请公布号 |
US2014262283(A1) |
申请公布日期 |
2014.09.18 |
| 申请号 |
US201314061575 |
申请日期 |
2013.10.23 |
| 申请人 |
Halliburton Energy Services, Inc. |
发明人 |
Savari Sharath;Choudhary Yogesh Kumar |
| 分类号 |
E21B43/25 |
主分类号 |
E21B43/25 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A method of treating a subterranean formation, the method comprising:
placing a first aqueous composition and a second aqueous composition in a subterranean formation, the placing comprising:
injecting the first aqueous composition through a tubular passage in a wellbore; andat least partially simultaneously injecting the second aqueous composition through an annular passage in the wellbore. |
| 地址 |
Houston TX US |
