| 摘要 |
A multi-chamber PV furnace and method for continuously processing the wafers is described. A preferred embodiment includes three main chambers that allow pre-heating, heating, and cooling of the target material in a streamlined process designed for continuous operation in a mass production environment. The three-chamber design shortens the processing time and permits continuous processing of batches of substrate material in an in-line fashion. Each of the three chambers or zones allows for independent control and management of processing temperature, pressure, and atmosphere by means of inlet gate and outlet gate valve mechanisms. |
