| 摘要 |
In a substrate processing device (1), a cup part (161) that forms a side space (160) in the periphery of a chamber (12) is made to contact a chamber cover part (122) that is separated from a chamber main body (121), thereby forming an expanded sealed space (100). A scanning nozzle (188) is attached to the cup part (161) in the side space (160), moves to positions above a substrate via a ring shape opening (81), and provides a chemical solution onto the substrate. When washing processing and drying processing are carried out on the substrate, the scanning nozzle (188) is accommodated in the side space (160) and an upper opening of the chamber main body (121) is closed by means of the chamber cover part (122), thereby isolating and sealing off a chamber space (120) from the side space (160). Thus, the chamber space (120) can be separated from the scanning nozzle (188). As a result, chemical solution mist and the like from the scanning nozzle (188) can be prevented from adhering to the substrate. |
