RESIST APPLICATION METHOD, METHOD FOR MANUFACTURING PIEZOELECTRIC VIBRATION PIECE, AND PIEZOELECTRIC VIBRATION PIECE

摘要

PROBLEM TO BE SOLVED: To provide a resist application method in which formation of a concavo-convex portion due to intrusion and deposition of a resist material is suppressed when the resist material is applied on both of a top surface and a back surface of a wafer, and thereby, decrease in patterning accuracy of an electrode pattern by exposure can be suppressed, and to provide a method for manufacturing a piezoelectric vibration piece by using the resist application method, and a piezoelectric vibration piece manufactured by the manufacturing method.SOLUTION: The resist application method includes a resist application step of applying a resist material to each of a first surface of a wafer and a second surface in an opposite side to the first surface of the wafer, and applying the resist material in a plurality of times on at least one of the first surface of the wafer and the second surface of the wafer. The surface of the wafer where the resist material is last applied in the above resist application step is different from the surface where the resist material is applied in a time once prior to the last time.