| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide: a curable composition for imprint by which even in thin film coating, a favorable pattern can be formed while causing less volatilization of components on a base material; a pattern formation method by use thereof; and a pattern obtained according to the method.SOLUTION: A curable composition for imprint comprises (A) at least one kind of polymerizable monomers, and (B) a photopolymerization initiator. In (A)the polymerizable monomers, the content of polymerizable monomers having a viscosity of 7 mPa s or larger at 25°C is 80 mass% or larger to all the polymerizable monomers.</p> |
