SUBSTRATE WITH MULTILAYER REFLECTION FILM, MANUFACTURING METHOD THEREFOR, METHOD FOR MANUFACTURING REFLECTION-TYPE MASK BLANK, METHOD FOR MANUFACTURING REFLECTION-TYPE MASK, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a substrate with a multilayer reflection film, which has high reflectivity and is superior in cleaning resistance.SOLUTION: A substrate 10 with the multilayer reflection film comprises a multilayer reflection film 2 for reflecting exposure light on a substrate 1, and a protective film 3 for protecting the multilayer reflection film 2. The multilayer reflection film 2 has a multilayer film structure in which a plurality of cycles are laminated when a laminated structure having a low refractive index layer and a high refractive index layer are laminated is counted as one cycle. The protective film 3 are formed of a reflectivity reducing and suppressing layer 31, a blocking layer 32 and an etching stopper layer 33 laminated in this order.