| 发明名称 |
Ion Source |
| 摘要 |
An ion source is provided that includes at least one electron gun. The electron gun includes an electron source for generating a beam of electrons and an inlet for receiving a gas. The electron gun also includes a plasma region defined by at least an anode and a ground element, where the plasma region can form a plasma from the gas received via the inlet. The plasma can be sustained by at least a portion of the beam of electrons. The electron gun further includes an outlet for delivering at least one of (i) ions generated by the plasma or (ii) at least a portion of the beam of electrons generated by the electron source. |
| 申请公布号 |
US2014265854(A1) |
申请公布日期 |
2014.09.18 |
| 申请号 |
US201313835441 |
申请日期 |
2013.03.15 |
| 申请人 |
NISSIN ION EQUIPMENT CO., LTD. |
发明人 |
Horsky Thomas N.;Hahto Sami K. |
| 分类号 |
H01J27/02 |
主分类号 |
H01J27/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. An ion source comprising:
at least one electron gun, the electron gun including:
an electron source for generating a beam of electrons;an inlet for receiving a gas;a plasma region defined by at least an anode and a ground element, the plasma region adapted to form a plasma from the gas received via the inlet, wherein the plasma is sustained by at least a portion of the beam of electrons; andan outlet for delivering at least one of (i) ions generated by the plasma or (ii) at least a portion of the beam of electrons. |
| 地址 |
Minami-Ku JP |
