发明名称 |
ORIENTATION SUBSTRATE, PROCESS OF MANUFACTURING ORIENTATION FILM SUBSTRATE, SPUTTERING APPARATUS, AND MULTIPLE CHAMBER DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To reduce cost of manufacture.SOLUTION: The orientation film substrate includes: an Si substrate 23 having a crystal plane of (100); an orientation film 31 of (100) formed by epitaxial growth on the Si substrate; and a conductive film 32, having magnetism, formed by epitaxial growth on the orientation film. |
申请公布号 |
JP2014170784(A) |
申请公布日期 |
2014.09.18 |
申请号 |
JP20130040599 |
申请日期 |
2013.03.01 |
申请人 |
YUUTEKKU:KK |
发明人 |
KIJIMA TAKESHI;HONDA YUJI;ARAKI TOMOYUKI |
分类号 |
H01L41/047;C23C14/08;H01L41/187;H01L41/257;H01L41/29;H01L41/316;H01L41/318 |
主分类号 |
H01L41/047 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|