发明名称 ORIENTATION SUBSTRATE, PROCESS OF MANUFACTURING ORIENTATION FILM SUBSTRATE, SPUTTERING APPARATUS, AND MULTIPLE CHAMBER DEVICE
摘要 PROBLEM TO BE SOLVED: To reduce cost of manufacture.SOLUTION: The orientation film substrate includes: an Si substrate 23 having a crystal plane of (100); an orientation film 31 of (100) formed by epitaxial growth on the Si substrate; and a conductive film 32, having magnetism, formed by epitaxial growth on the orientation film.
申请公布号 JP2014170784(A) 申请公布日期 2014.09.18
申请号 JP20130040599 申请日期 2013.03.01
申请人 YUUTEKKU:KK 发明人 KIJIMA TAKESHI;HONDA YUJI;ARAKI TOMOYUKI
分类号 H01L41/047;C23C14/08;H01L41/187;H01L41/257;H01L41/29;H01L41/316;H01L41/318 主分类号 H01L41/047
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