发明名称 ELECTROSTATIC CHUCK REFURBISHMENT
摘要 An indication that an electrostatic chuck has a gas leakage rate that exceeds a leakage threshold is received. A determination is made as to whether a first polishing procedure that polishes surface features on a surface of the electrostatic chuck without removing the surface features would reduce a thickness of the surface features to below a thickness threshold. The electrostatic chuck is polished using the first polishing procedure responsive to determining that the first polishing procedure would not reduce the thickness of the surface features to below the thickness threshold. Responsive to determining that the first polishing procedure would reduce the thickness of the surface features to below the thickness threshold, a second polishing procedure that removes the surface features from the surface of the electrostatic chuck is performed. After the second polishing procedure, new surface features are formed on the surface of the electrostatic chuck.
申请公布号 US2014263176(A1) 申请公布日期 2014.09.18
申请号 US201414209967 申请日期 2014.03.13
申请人 Applied Materials, Inc. 发明人 Parkhe Vijay D.;Narendrnath Kadthala Ramaya
分类号 B44C1/22 主分类号 B44C1/22
代理机构 代理人
主权项 1. A method of refurbishing an electrostatic chuck comprising: receiving an indication that the electrostatic chuck has a gas leakage rate that exceeds a leakage threshold; determining whether a first polishing procedure that polishes surface features on a surface of the electrostatic chuck without removing the surface features would reduce a thickness of the surface features to below a thickness threshold; and polishing the electrostatic chuck using the first polishing procedure responsive to determining that the first polishing procedure would not reduce the thickness of the surface features to below the thickness threshold.
地址 Santa Clara CA US