发明名称
摘要 <p>A mask and an optical filter manufacturing apparatus including the same are provided. A mask used for a roll-to-roll process of forming patterns in a base film configured to move along a curved surface includes a mask body having a curved surface disposed opposite a roll around which the base film is wound and a plane surface corresponding to the reverse side of the curved surface. The curved surface of the mask body is disposed a predetermined distance apart from a curved surface of the roll. The mask and optical filter manufacturing apparatus enable formation of uniform patterns on the base film to enhance the quality of products and precisely attain the properties of the base film.</p>
申请公布号 JP2014524053(A) 申请公布日期 2014.09.18
申请号 JP20140521570 申请日期 2012.07.23
申请人 发明人
分类号 G03F1/00;G02B5/30;G03F1/54;G03F1/60;G03F7/20 主分类号 G03F1/00
代理机构 代理人
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