PATTERN-INDEPENDENT AND HYBRID MATCHING/TUNING INCLUDING LIGHT MANIPULATION BY PROJECTION OPTICS

摘要

Described herein are methods for matching the characteristics of a lithographic projection apparatus to a reference lithographic projection apparatus, where the matching includes optimizing illumination source and projection optics characteristics. The projection optics can be used to shape wavefront in the lithographic projection apparatus. According to the embodiments herein, the methods can be accelerated by using linear fitting algorithm or using Taylor series expansion using partial derivatives of transmission cross coefficients (TCCs).

主权项

1. A computer-implemented method for tuning a lithographic process to a reference lithographic process, the lithographic process being configured for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus comprising an illumination source and projection optics, the method comprising:
defining a multi-variable cost function of a plurality of design variables that represent characteristics of the lithographic process, wherein the cost function comprises a difference in optical characteristics of the lithographic projection apparatus between the lithographic process and the reference lithographic process and wherein at least some of the design variables comprise characteristics of the projection optics; and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a predefined termination condition is satisfied.