发明名称 SOLID STATE IMAGING DEVICE AND METHOD FOR MANUFACTURING THE SAME
摘要 According to one embodiment, a solid state imaging device includes a silicon substrate unit, a color filter layer, first, second and third optical layers. The silicon substrate unit includes imaging units provided in a plane parallel to a major surface. The color filter layer is apart from the silicon substrate unit. The color filter has a lower refractive index than the silicon substrate unit. The first optical layer has a lower first refractive index than the color filter layer and the silicon substrate unit, and is light transmissive. The second optical layer has a second refractive index higher than the first refractive index and lower than the refractive index of the silicon substrate unit, is light transmissive. The third optical layer has a third refractive index lower than the refractive index of the color filter layer and lower than the second refractive index, and is light transmissive.
申请公布号 US2014264688(A1) 申请公布日期 2014.09.18
申请号 US201314023593 申请日期 2013.09.11
申请人 Kabushiki Kaisha Toshiba 发明人 KANREI Nobuki
分类号 H01L27/146 主分类号 H01L27/146
代理机构 代理人
主权项 1. A solid state imaging device comprising: a silicon substrate unit including a plurality of imaging units provided in a plane parallel to a major surface; a color filter layer apart from the silicon substrate unit in a direction perpendicular to the major surface, the color filter having a refractive index lower than a refractive index of the silicon substrate unit; a first optical layer provided between the silicon substrate unit and the color filter layer, the first optical layer having a first refractive index lower than the refractive index of the color filter layer and lower than the refractive index of the silicon substrate unit, and being light transmissive; a second optical layer provided between the first optical layer and the color filter layer, the second optical layer having a second refractive index higher than the first refractive index and lower than the refractive index of the silicon substrate unit, being light transmissive, and being a polycrystal; and a third optical layer provided between the second optical layer and the color filter layer, the third optical layer having a third refractive index lower than the refractive index of the color filter layer and lower than the second refractive index, and being light transmissive.
地址 Minato-ku JP
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