发明名称 |
SOLID STATE IMAGING DEVICE AND METHOD FOR MANUFACTURING THE SAME |
摘要 |
According to one embodiment, a solid state imaging device includes a silicon substrate unit, a color filter layer, first, second and third optical layers. The silicon substrate unit includes imaging units provided in a plane parallel to a major surface. The color filter layer is apart from the silicon substrate unit. The color filter has a lower refractive index than the silicon substrate unit. The first optical layer has a lower first refractive index than the color filter layer and the silicon substrate unit, and is light transmissive. The second optical layer has a second refractive index higher than the first refractive index and lower than the refractive index of the silicon substrate unit, is light transmissive. The third optical layer has a third refractive index lower than the refractive index of the color filter layer and lower than the second refractive index, and is light transmissive. |
申请公布号 |
US2014264688(A1) |
申请公布日期 |
2014.09.18 |
申请号 |
US201314023593 |
申请日期 |
2013.09.11 |
申请人 |
Kabushiki Kaisha Toshiba |
发明人 |
KANREI Nobuki |
分类号 |
H01L27/146 |
主分类号 |
H01L27/146 |
代理机构 |
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代理人 |
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主权项 |
1. A solid state imaging device comprising:
a silicon substrate unit including a plurality of imaging units provided in a plane parallel to a major surface; a color filter layer apart from the silicon substrate unit in a direction perpendicular to the major surface, the color filter having a refractive index lower than a refractive index of the silicon substrate unit; a first optical layer provided between the silicon substrate unit and the color filter layer, the first optical layer having a first refractive index lower than the refractive index of the color filter layer and lower than the refractive index of the silicon substrate unit, and being light transmissive; a second optical layer provided between the first optical layer and the color filter layer, the second optical layer having a second refractive index higher than the first refractive index and lower than the refractive index of the silicon substrate unit, being light transmissive, and being a polycrystal; and a third optical layer provided between the second optical layer and the color filter layer, the third optical layer having a third refractive index lower than the refractive index of the color filter layer and lower than the second refractive index, and being light transmissive. |
地址 |
Minato-ku JP |