发明名称 |
SEMICONDUCTOR DEVICE |
摘要 |
To improve performance of a semiconductor device. For example, on the assumption that a superlattice layer is inserted between a buffer layer and a channel layer, a concentration of acceptors introduced into nitride semiconductor layers forming a part of the superlattice layer is higher than a concentration of acceptors introduced into nitride semiconductor layers forming the other part of the superlattice layer. That is, the concentration of acceptors introduced into the nitride semiconductor layers having a small band gap is higher than the concentration of acceptors introduced into the nitride semiconductor layers having a large band gap. |
申请公布号 |
US2014264274(A1) |
申请公布日期 |
2014.09.18 |
申请号 |
US201414198430 |
申请日期 |
2014.03.05 |
申请人 |
Renesas Electronics Corporation |
发明人 |
NAKAYAMA Tatsuo;MIYAMOTO Hironobu;OKAMOTO Yasuhiro;NEGA Ryohei;KANAZAWA Masaaki;INOUE Takashi |
分类号 |
H01L29/778 |
主分类号 |
H01L29/778 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor device comprising:
a superlattice layer including a laminated structure of a first nitride semiconductor layer and a second nitride semiconductor layer having a band gap larger than that of the first nitride semiconductor layer, wherein a concentration of conductive impurities introduced into the first nitride semiconductor layer is larger than a concentration of conductive impurities introduced into the second nitride semiconductor layer. |
地址 |
Kawasaki-shi JP |