发明名称 SEMICONDUCTOR DEVICE
摘要 To improve performance of a semiconductor device. For example, on the assumption that a superlattice layer is inserted between a buffer layer and a channel layer, a concentration of acceptors introduced into nitride semiconductor layers forming a part of the superlattice layer is higher than a concentration of acceptors introduced into nitride semiconductor layers forming the other part of the superlattice layer. That is, the concentration of acceptors introduced into the nitride semiconductor layers having a small band gap is higher than the concentration of acceptors introduced into the nitride semiconductor layers having a large band gap.
申请公布号 US2014264274(A1) 申请公布日期 2014.09.18
申请号 US201414198430 申请日期 2014.03.05
申请人 Renesas Electronics Corporation 发明人 NAKAYAMA Tatsuo;MIYAMOTO Hironobu;OKAMOTO Yasuhiro;NEGA Ryohei;KANAZAWA Masaaki;INOUE Takashi
分类号 H01L29/778 主分类号 H01L29/778
代理机构 代理人
主权项 1. A semiconductor device comprising: a superlattice layer including a laminated structure of a first nitride semiconductor layer and a second nitride semiconductor layer having a band gap larger than that of the first nitride semiconductor layer, wherein a concentration of conductive impurities introduced into the first nitride semiconductor layer is larger than a concentration of conductive impurities introduced into the second nitride semiconductor layer.
地址 Kawasaki-shi JP