发明名称 EXPOSURE DEVICE, EXPOSURE METHOD AND DEVICE MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an exposure device that prevents leakage of fluid filled in an optical path space of exposing light between an optical member and a substrate and that suppresses temperature change of the substrate and accurately exposes the substrate.SOLUTION: An exposure device comprises a gas seal mechanism (3) that generates an air current on a substrate (P) and seals fluid (LQ) filled in an optical path space of exposing light; and a compensation mechanism (5) that compensates temperature change of the substrate (P) resulting from the air current generated by the gas seal mechanism (3).
申请公布号 JP2014170962(A) 申请公布日期 2014.09.18
申请号 JP20140103745 申请日期 2014.05.19
申请人 NIKON CORP 发明人 KIUCHI TORU
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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