FAST RESPONSE FLUID CONTROL SYSTEM

摘要

A plasma processing apparatus and method to control a temperature of a chamber component therein are described. A process chamber may include a temperature controlled chamber component and at least one remote heat transfer fluid loop comprising a first heat exchanger having a primary side in fluid communication with a heat sink or heat source, and a local heat transfer fluid loop placing the chamber component in fluid communication with a secondary side of the first heat exchanger. The local loop may be of significantly smaller fluid volume than the remote loop(s) and circulated to provide thermal load of uniform temperature. Temperature control of heat transfer fluid in the local loop and temperature control of the chamber component may be implemented with a cascaded control algorithm. The plasma processing apparatus further includes an AC heated electrostatic chuck (ESC) assembly.

主权项

1. A plasma processing apparatus, comprising:
a process chamber including a temperature controlled component; a first heat transfer fluid loop comprising a first heat exchanger having a primary side in fluid communication with a heat sink; and a second heat transfer fluid loop placing the temperature controlled component in fluid communication with a secondary side of the first heat exchanger, wherein the second heat transfer loop further comprises an inline heater or a second heat exchanger disposed in parallel with the first heat exchanger to thermally couple the temperature controlled component to a heat source; a pump to circulate a heat transfer fluid through the second heat transfer loop; at least one mixing valve disposed in the second heat transfer loop to apportion heat transfer fluid flow between the first heat exchanger, and the inline heater, or the second heat exchanger; and an AC heated electrostatic chuck (ESC) assembly.