DARK-FIELD SEMICONDUCTOR WAFER INSPECTION DEVICE

摘要

The invention relates to a dark-field semi-conductor wafer inspection device including, in the following order, a light source for emitting an incident beam to a wafer along a first axis, a concentrator (7) that is symmetrical in relation to a plane passing through the first and second axes and is provided with a mirror that is elliptically cut along a plane perpendicular to an axis perpendicular to the first axis and has a generator parallel to the first axis, parallel first and second slits (13, 14) being set up side-ways in first and second portions (9, 10) of the concentrator at the points for concentrating the light that is scattered by the wafer and reflected by the second and first portions of the concentrator, respectively, and a photomultiplier using a slit.

主权项

1. A device for inspecting semiconductor wafers, comprising, in this order:
a light source for emitting an incident beam towards a wafer along a first axis, a concentrator which is symmetrical relatively to a plane passing through the first axis and a second axis perpendicular to the first axis and provided with a mirror having an elliptical cross-section along a plane perpendicular to the second axis, and having a generatrix parallel to the first axis, first and second parallel slits being made laterally in first and second portions of the concentrator at the concentration points of the light scattered by the wafer and reflected by the second and first portions of the concentrator respectively, and one photomultiplier per slit.