Multi-Spot Defect Inspection System

摘要

The disclosure is directed to a system and method for inspecting a spinning sample by substantially simultaneously scanning multiple spots on a surface of the sample utilizing a plurality of illumination beams. Portions of illumination reflected, scattered, or radiated from respective spots on the surface of the sample are collected by at least one detector array. Information associated with at least one defect of the sample is determined by at least one computing system in communication with the detector array. According to various embodiments, at least one of scan pitch, spot size, spot separation, and spin rate is controlled to compensate pitch error due to tangential spot separation.

主权项

1. A system for inspecting a sample, comprising:
a stage assembly configured to support a sample, the stage assembly including at least one rotating actuator configured to spin the sample; at least one illumination source configured to provide illumination along an illumination path to a surface of the sample; a spot array generator disposed along the illumination path, the spot array generator configured to direct portions of illumination according to a selected pattern to illuminate a plurality of spots on the surface of the sample; at least one detector array configured to receive illumination reflected, scattered, or radiated from the plurality of spots on the surface of the sample; a computing system in communication with the at least one detector array, the computing system configured to determine information associated with at least one defect of the sample based upon the illumination received by the at least one detector array, wherein at least one of scan pitch, spot size, spot separation, and spin rate is controllable to compensate pitch error due to tangential spot separation.