ELECTRON BEAM LITHOGRAPHY SYSTEMS AND METHODS INCLUDING TIME DIVISION MULTIPLEX LOADING

摘要

The present disclosure provides a systems and methods for e-beam lithography. One system includes an electron source operable to produce a beam and an array of pixels operable to pattern the beam. Control circuitry is spaced a distance from and coupled to the array of pixels. The control circuitry uses time domain multiplex loading (TMDL) to control the array of pixels.

主权项

1. A system, comprising:
an electron source operable to produce a beam; an array of pixels operable to pattern the beam; and control circuitry spaced a distance from and coupled to the array of pixels, wherein the control circuitry uses time domain multiplex loading to control the array of pixels.