发明名称 METHOD FOR PRODUCING BI-POLAR COMPLEMENTARY STRUCTURE PATTERNS
摘要 The embodiments disclose a method including creating at least one first structure including magnetically isolated features in servo fields, and creating at least one second structure including finger-structure patterns including intentional weak nucleation points in servo fields to create a regular bi-polar magnetization direction after bulk DC initialization, and wherein the first and second structures form bi-polar complementary structure patterns.
申请公布号 US2014266524(A1) 申请公布日期 2014.09.18
申请号 US201414199882 申请日期 2014.03.06
申请人 Seagate Technology LLC 发明人 Steiner Philip;van de Veerdonk René J.M.
分类号 H01F7/02;H01F41/02 主分类号 H01F7/02
代理机构 代理人
主权项 1. A method, comprising: creating at least one first structure including magnetically isolated features in servo fields; and creating at least one second structure including finger-structure patterns including intentional weak nucleation points in servo fields to create a regular bi-polar magnetization direction after bulk DC initialization, and wherein the first and second structures form bi-polar complementary structure patterns.
地址 Cupertino CA US