| 发明名称 |
MINIMAL CONTACT EDGE RING FOR RAPID THERMAL PROCESSING |
| 摘要 |
Embodiments of the present invention generally relate to a support ring for supporting a substrate during thermal processing in a process chamber. The support ring generally includes a ring body, an outer rib extending from a first surface of the ring body, a midrib extending from the first surface of the ring body, and a substrate support extending from a second surface of the ring body. The support ring reduces thermal coupling between a substrate and the support ring. |
| 申请公布号 |
US2014265101(A1) |
申请公布日期 |
2014.09.18 |
| 申请号 |
US201414203163 |
申请日期 |
2014.03.10 |
| 申请人 |
Applied Materials, Inc. |
发明人 |
PAN Heng;BAUTISTA Kevin J. |
| 分类号 |
H01L21/683 |
主分类号 |
H01L21/683 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A support ring, comprising:
a ring body; an outer rib extending from a first surface of the ring body; a midrib extending from the first surface of the ring body; and a substrate support rib extending from a second surface of the ring body. |
| 地址 |
Santa Clara CA US |
