发明名称 |
ION SOURCE, AND ION BEAM IRRADIATION DEVICE COMPRISING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide an ion source which improves efficiency of cleaning performed in a high-frequency type ion source.SOLUTION: An ion source IS generates plasma P in a plasma chamber 1 by using a high-frequency power supply Vh, and extracts an ion beam IB from the plasma P by using an extraction electrode system 2 consisting of a plurality of electrodes arranged adjacently to the plasma chamber 1. In cleaning, a cleaning gas is introduced into the plasma chamber 1, while the high-frequency power supply Vh is connected to the plasma chamber 1, and a bias power supply Vb is connected between the plasma chamber 1 and any of the electrodes constituting the extraction electrode system 2. |
申请公布号 |
JP2014170631(A) |
申请公布日期 |
2014.09.18 |
申请号 |
JP20130040562 |
申请日期 |
2013.03.01 |
申请人 |
NISSIN ION EQUIPMENT CO LTD |
发明人 |
TAKAHASHI MASATO;YAMAMOTO TETSURO |
分类号 |
H01J27/16;H01J37/08;H01J37/317 |
主分类号 |
H01J27/16 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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