发明名称 |
RADIATION-SENSITIVE RESIN COMPOSITION, INSULATING FILM, AND ORGANIC EL ELEMENT |
摘要 |
PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which is prepared without using NMP and is capable of forming an insulating film of an organic EL element having good characteristics, and to provide an insulating film and an organic EL element.SOLUTION: The radiation-sensitive resin composition contains: (A) a polyimide and (B) a polyamic acid each obtained by condensing an acid component having a group of formula (1-1) and an amine component having a group of formula (1-2); (C) a quinonediazide compound; and (D) a silane coupling agent. In an organic EL display element 1, a first insulating film 10 on a TFT 3 and a second insulating film 13 serving as a partition of an organic light-emitting layer 14 are formed from the radiation-sensitive resin composition. |
申请公布号 |
JP2014170080(A) |
申请公布日期 |
2014.09.18 |
申请号 |
JP20130041276 |
申请日期 |
2013.03.01 |
申请人 |
JSR CORP |
发明人 |
TAKAMATSU NOBUHIRO |
分类号 |
G03F7/023;C08K5/28;C08K5/544;C08L79/08;G03F7/075;H01L21/027 |
主分类号 |
G03F7/023 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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