PHOTORESIST SYSTEM AND METHOD

摘要

A system and method for photoresists is provided. In an embodiment a cross-linking or coupling reagent is included within a photoresist composition. The cross-linking or coupling reagent will react with the polymer resin within the photoresist composition to cross-link or couple the polymers together, resulting in a polymer with a larger molecular weight. This larger molecular weight will cause the dissolution rate of the photoresist to decrease, leading to a better depth of focus for the line.

主权项

1. A method for manufacturing a semiconductor device, the method comprising:
applying a photoresist to a substrate, the photoresist comprising a resin, the resin comprising a plurality of polymers, each one of the plurality of polymers comprising a backbone; exposing the photoresist to a patterned energy, the patterned energy inducing a reaction to form a bond between a backbone of a first one of the plurality of polymers and a backbone of a second one of the plurality of polymers; and developing the photoresist after the exposing the photoresist, the developing being performed with a negative tone developer.