A FLOW LITHOGRAPHY TECHNIQUE TO FORM MICROSTRUCTURES USING OPTICAL ARRAYS

摘要

A continuous flow projection lithography system to form microstructures using an optical array incorporated in a continuous coating process is provided. A mask is placed at a distance from the array. Each element of the array projects one image of the mask onto a substrate, effectively forming an array thereon. A coating process allows flows that can be used to define functional regions of particles or supporting layers that prevent adhesion of crosslinked polymers to surfaces.

主权项

1. A system for synthesizing microstructures comprising:
a light source; a mask having or generating at least one mask feature and being positioned to convey light from the light source; a moving target substrate having precursor material carried thereon; and, an array of optical elements positioned to such that each optical element corresponds to a mask feature projected from the light source via the mask onto the moving target substrate to form microstructures in the precursor material.