| 发明名称 |
Lithography System with an Embedded Cleaning Module |
| 摘要 |
The present disclosure provides a lithography system. The lithography system includes an exposing module configured to perform a lithography exposing process using a mask secured on a mask stage; and a cleaning module integrated in the exposing module and designed to clean at least one of the mask and the mask stage using an attraction mechanism. |
| 申请公布号 |
US2014268074(A1) |
申请公布日期 |
2014.09.18 |
| 申请号 |
US201414168114 |
申请日期 |
2014.01.30 |
| 申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Chien Shang-Chieh;Chen Jeng-Horng;Wu Jui-Ching;Chen Chia-Chen;Hsieh Hung-Chang;Lu Chi-Lun;Yu Chia-Hao;Chang Shih-Ming;Yen Anthony |
| 分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A lithography system, comprising:
an exposing module configured to perform a lithography exposing process using a mask secured on a mask stage; and a cleaning module integrated in the exposing module and designed to clean at least one of the mask and the mask stage using an attraction mechanism. |
| 地址 |
Hsin-Chu TW |
