发明名称 |
DEPOSITION APPARATUS AND METHODS |
摘要 |
A deposition apparatus (20) comprising: a chamber (22); a process gas source (62) coupled to the chamber; a vacuum pump (52) coupled to the chamber; at least two electron guns (26); one or more power supplies (30) coupled to the electron guns; a plurality of crucibles (32,33,34) positioned or positionable in an operative position within a field of view of at least one said electron gun; and a part holder (170) having at least one operative position for holding parts spaced above the crucibles by a standoff height H. The standoff height H is adjustable in a range including at least 22 inches. |
申请公布号 |
WO2014144189(A1) |
申请公布日期 |
2014.09.18 |
申请号 |
WO2014US28489 |
申请日期 |
2014.03.14 |
申请人 |
UNITED TECHNOLOGIES CORPORATION |
发明人 |
HAZEL, BRIAN T.;MALONEY, MICHAEL J.;NEAL, JAMES W.;LITTON, DAVID A. |
分类号 |
C23C14/22 |
主分类号 |
C23C14/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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