发明名称 |
METAL-OXIDE-SEMICONDUCTOR FIELD-EFFECT TRANSISTOR WITH EXTENDED GATE DIELECTRIC LAYER |
摘要 |
<p>A metal-oxide-semiconductor field-effect transistor (MOSFET) includes a substrate, a source and a drain on the substrate, a gate electrode which is arranged on the substrate between the source and the drain, and a gate dielectric layer which is arranged between the substrate and the gate electrode. At least a part of the gate dielectric layer is extended toward the source or the drain via the gate electrode.</p> |
申请公布号 |
KR20140111216(A) |
申请公布日期 |
2014.09.18 |
申请号 |
KR20130139921 |
申请日期 |
2013.11.18 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. |
发明人 |
LIN SHIUAN JENG;CHENG SHYH WEI;CHU CHE JUNG |
分类号 |
H01L29/78;H01L21/336 |
主分类号 |
H01L29/78 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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