发明名称 METAL-OXIDE-SEMICONDUCTOR FIELD-EFFECT TRANSISTOR WITH EXTENDED GATE DIELECTRIC LAYER
摘要 <p>A metal-oxide-semiconductor field-effect transistor (MOSFET) includes a substrate, a source and a drain on the substrate, a gate electrode which is arranged on the substrate between the source and the drain, and a gate dielectric layer which is arranged between the substrate and the gate electrode. At least a part of the gate dielectric layer is extended toward the source or the drain via the gate electrode.</p>
申请公布号 KR20140111216(A) 申请公布日期 2014.09.18
申请号 KR20130139921 申请日期 2013.11.18
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. 发明人 LIN SHIUAN JENG;CHENG SHYH WEI;CHU CHE JUNG
分类号 H01L29/78;H01L21/336 主分类号 H01L29/78
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