| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern having an excellent shape and resolution can be produced.SOLUTION: The resist composition comprises a resin (A1), a resin (A2), a resin (A3) and an acid generator described below. The resin (A1) includes a specific (meth)acryl-based structural unit having a dissociable group; the resin (A2) includes a specific styrene-based structural unit having a dissociable group and a hydroxystyrene-based structural unit; and the resin (A3) includes a structural unit expressed by formula (a5-1). In formula (a5-1), Ra50 represents a hydrogen atom or a methyl group; and Ra51 represents a saturated hydrocarbon group having 1 to 18 carbon atoms. |
