发明名称 Systems and Methods for a Narrow Band High Transmittance Interference Filter
摘要 The present disclosure provides an interference filter, a lithography system incorporating an interference filter, and a method of fabricating an interference filter. The interference filter includes a transparent substrate having a front surface and a back surface, a plurality of alternating material layers formed over the front surface of the transparent substrate that form a bandpass filter, and an anti-reflective structure formed over the back surface of the transparent substrate. The alternating material layers alternate between a relatively high refractive index material and a relatively low refractive index material.
申请公布号 US2014273459(A1) 申请公布日期 2014.09.18
申请号 US201313929419 申请日期 2013.06.27
申请人 Taiwan Semiconductor Manufacturing Company, Ltd. 发明人 Hung Wolf;Chen Chung-Nan;Shih Jaw-Lih;Chou Hong-Hsing;Wang Yeh-Chieh
分类号 G03F7/20;H01L21/308;G02B5/28 主分类号 G03F7/20
代理机构 代理人
主权项 1. An interference filter comprising: a transparent substrate having a front surface and a back surface; a plurality of alternating material layers formed over the front surface of the transparent substrate, wherein a sequence of the material layers alternates between relatively high and relatively low refractive indices; and an anti-reflective structure formed over the back surface of the transparent substrate.
地址 Hsin-Chu TW