发明名称 |
Systems and Methods for a Narrow Band High Transmittance Interference Filter |
摘要 |
The present disclosure provides an interference filter, a lithography system incorporating an interference filter, and a method of fabricating an interference filter. The interference filter includes a transparent substrate having a front surface and a back surface, a plurality of alternating material layers formed over the front surface of the transparent substrate that form a bandpass filter, and an anti-reflective structure formed over the back surface of the transparent substrate. The alternating material layers alternate between a relatively high refractive index material and a relatively low refractive index material. |
申请公布号 |
US2014273459(A1) |
申请公布日期 |
2014.09.18 |
申请号 |
US201313929419 |
申请日期 |
2013.06.27 |
申请人 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
发明人 |
Hung Wolf;Chen Chung-Nan;Shih Jaw-Lih;Chou Hong-Hsing;Wang Yeh-Chieh |
分类号 |
G03F7/20;H01L21/308;G02B5/28 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
1. An interference filter comprising:
a transparent substrate having a front surface and a back surface; a plurality of alternating material layers formed over the front surface of the transparent substrate, wherein a sequence of the material layers alternates between relatively high and relatively low refractive indices; and an anti-reflective structure formed over the back surface of the transparent substrate. |
地址 |
Hsin-Chu TW |