发明名称 Strained InGaAs Quantum Wells for Complementary Transistors
摘要 An InGaAs n-channel quantum well heterostructure for use in a complementary transistor having a Sb-based p-channel. The heterostructure includes a buffer layer having a lattice constant intermediate that of the n- and p-channel materials and which is configured to accommodate the strain produced by a lattice-constant mismatch between the n-channel and p-channel materials.
申请公布号 US2014264278(A1) 申请公布日期 2014.09.18
申请号 US201414156592 申请日期 2014.01.16
申请人 Bennett Brian R.;Boos John Bradley;Chick Theresa F.;Champlain James G. 发明人 Bennett Brian R.;Boos John Bradley;Chick Theresa F.;Champlain James G.
分类号 H01L29/15;H01L29/778 主分类号 H01L29/15
代理机构 代理人
主权项 1. A complementary semiconductor heterostructure, comprising: an InxGa1-xAs n-channel and an antimonide p-channel, the n-channel and p-channel having a lattice mismatch which produces a strain between the n- and p-channels; and a buffer layer common to the n- and p-channels, the buffer layer having a lattice constant intermediate a lattice constant of the InGaAs n-channel and a lattice constant of the antimonide p-channel; wherein the buffer layer is configured to accommodate the strain produced by a lattice-constant mismatch between the n- and p-channels.
地址 Arlington VA US