发明名称 |
Strained InGaAs Quantum Wells for Complementary Transistors |
摘要 |
An InGaAs n-channel quantum well heterostructure for use in a complementary transistor having a Sb-based p-channel. The heterostructure includes a buffer layer having a lattice constant intermediate that of the n- and p-channel materials and which is configured to accommodate the strain produced by a lattice-constant mismatch between the n-channel and p-channel materials. |
申请公布号 |
US2014264278(A1) |
申请公布日期 |
2014.09.18 |
申请号 |
US201414156592 |
申请日期 |
2014.01.16 |
申请人 |
Bennett Brian R.;Boos John Bradley;Chick Theresa F.;Champlain James G. |
发明人 |
Bennett Brian R.;Boos John Bradley;Chick Theresa F.;Champlain James G. |
分类号 |
H01L29/15;H01L29/778 |
主分类号 |
H01L29/15 |
代理机构 |
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代理人 |
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主权项 |
1. A complementary semiconductor heterostructure, comprising:
an InxGa1-xAs n-channel and an antimonide p-channel, the n-channel and p-channel having a lattice mismatch which produces a strain between the n- and p-channels; and a buffer layer common to the n- and p-channels, the buffer layer having a lattice constant intermediate a lattice constant of the InGaAs n-channel and a lattice constant of the antimonide p-channel; wherein the buffer layer is configured to accommodate the strain produced by a lattice-constant mismatch between the n- and p-channels. |
地址 |
Arlington VA US |