发明名称 CHARGED PARTICLE BEAM WRITING APPARATUS, APERTURE UNIT, AND CHARGED PARTICLE BEAM WRITING METHOD
摘要 A charged particle beam writing apparatus according to an embodiment includes: a beam emitter configured to emit a charged particle beam; an aperture having an opening portion through which the charged particle beam emitted by the beam emitter passes; an aperture beam tube being provided on a surface of the aperture and functioning as a thermally conductive member having thermal conductivity; and a heater provided on a surface of the aperture beam tube and configured to supply heat to the aperture via the aperture beam tube.
申请公布号 US2014273536(A1) 申请公布日期 2014.09.18
申请号 US201414193182 申请日期 2014.02.28
申请人 NuFlare Technology, Inc. 发明人 NISHIYAMA Tetsuro
分类号 H01J37/317;H01L21/263 主分类号 H01J37/317
代理机构 代理人
主权项 1. A charged particle beam writing apparatus comprising: a beam emitter configured to emit a charged particle beam; an aperture having an opening portion through which the charged particle beam emitted by the beam emitter passes; a thermally conductive member provided on a surface of the aperture and having thermal conductivity; and a heater provided on a surface of the thermally conductive member and configured to supply heat to the aperture via the thermally conductive member.
地址 Yokohama JP
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